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Nanotubes by CF4 Plasma Treatment for SF6 Decomposition

gas sensors because of their high surface efficiency, rapidity, and nonsignificant whereas CF4- and SF6-treated CNTs are highly

gas,CF4 gas,liquid ammonia,methane,standard gas mixture-

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field breakdown characteristics of SF6/CF4 mixtures at

The breakdown and the corona inception voltages experiments of SFsub6/sub/CFsub4/sub mixtures in non-uniform

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Last modification on : Thursday, February 7, 2019 - 4:56:13 PMReactive ion etching of SiC in SF6 gas: detection of CF, CF2 and SiF2

Nanotubes by CF4 Plasma Treatment for SF6 Decomposition

gas sensors because of their high surface efficiency, rapidity, and nonsignificant whereas CF4- and SF6-treated CNTs are highly

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Solubility of 13 non-polar gases (He, Ne, Ar, Kr, Xe, H2~, D2

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Chemistry studies of SF6/CF4, SF6/O2 and CF4/O2 gas phase

operational conditions: total gas flow rate, gas pressure, and plasmas generated with SF6 and CF4 mixtures or mixed separately with

Use of SF6 and CF4 | SpringerLink

The design and use of equipment and installations applying SF6 gas or SF6/CF4 gas mixtures have been considered in Sect.  12.2and Part C of this

of Si and WSiN using ECR plasma of SF6-CF4 gas mixture

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Negative ion motion in the mixtures of SF6 with CF4 and CH4-Ar.

This paper deals with the measurement of the mobility of negative ions in the mixtures of SF6 with CF4 and the CH4-Ar (50:50) binary mixture with

CF3IN2_CF3I CF3I

We use a binary gas mixture Monte Carlo simulation model to calculate the electron transport parameters in SF6/CF4 mixtures in uniform electric fields

CF_4-

The fluorination of the polymer polyethylene terephthalate in plasma created from SF6 or CF4 gas at various pressures was investigated. The surface was

MFC, UFC-1660, CF4, H2, Cl2, N2, HBr, SF6, different gas

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in 50%SF6-50%CF4mixtures at 1 atm -

equilibrium and transport properties of low-density gas mixtures. SF6, Ar–C(CH3)4, Kr–CH4, Kr–CF4, Kr–SF6, Kr–C(CH3)4,

Solubility of Gases in Liquids. 20. Solubility of He, Ne, Ar,

CF4, and SF6 dissolved in several homologous n-alkanes, n-ClH2l+2, and appropriate molecular and/or bulk properties of the gases and n-

for separation of SF6 from CF4 /air-containing gas stream

2002521-A method and apparatus for the separation and recovery of SF.sub.6 from a gas mixture consisting essentially of SF.sub.6, CF.sub.4, and N.su

CFCN/N

The characteristics of Si etching with electron cyclotron resonance (ECR) plasma of SF6–CF4 are studied in order to improve anisotropy in dry etching

GISCF4 - EMT

A mixture of acetylene (C2H2) and carbon tetrafluoride (CF4) gas was 40%, while an antibacterial efficiency of more than 92% was achieved [62

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in the dielectric strength of SF6+CF4+Ar mixtures (a) 40%

Download scientific diagram| The synergism in the dielectric strength of SF6+CF4+Ar mixtures (a) 40% Ar black line, (b) 50% Ar red line, (c)

Electron swarm coefficients in SF6 and CF4 gas mixtures from

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CFCs、HFCs、SF_6CF_4-

Reactive ion etching of SiC in SF6 gas: detection of CF, CF2 and SiF2 etch products. Applied Physics Letters, American Institute of Physics, 2001,

Breakdown characteristics of SF6 /CF4 mixtures in 25.8 kV

SFsub6/sub gas has excellent dielectric strength, but it causes global warming about 23900 times more than COsub2/

characteristics of SF6-N2 and SF6-CF4 gas mixtures |

2017101- on the insulation characteristics of SF6-N2 and SF6-CF4 gas mixturesItisfoundthatalargepercentageofCO2 canobviouslyreduceconcentrationso